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Fundamentals of Material Processing II

Fundamentals of Material Processing II. Instructor: Prof. Shashank Shekhar and Prof. Anshu Gaur, Department of Materials Science and Engineering, IIT Kanpur. The aim of the course is to acquaint students with the fundamentals involved in the processing of materials. Various materials processes are used in variety of industries to create and form materials for wide range of applications. There are some commonalities behind all these processes and the aim of this course is to go through these fundamental physics and materials science behind these processes so as to be able to understand, design and predict the outcome of these methods. At the end of this course, students should be able to answer the following questions: (a) What are the various fundamental material processing techniques and the science behind it; (b) What processing method to use for a given material and a given application. This course is offered in two parts of 20 hours each. First part of the course deals with Solidification and Powder Metallurgy, while the second part deals with Metal processing and Thin film deposition. (from nptel.ac.in)

Lecture 31 - Chemical Vapor Deposition I

This lecture contains following topics: 1) Difference between PVD and CVD, 2) Introduction to CVD process, 3) Instrumentation of CVD process.


Go to the Course Home or watch other lectures:

Stress and Strain Analysis and Yield Criteria
Lecture 01 - Introduction to Metal Working
Lecture 02 - Continuum Mechanics
Lecture 03 - Stress Invariants
Lecture 04 - Strain Tensors and Mohr Circle for Strains
Lecture 05 - Yield Stress Criterion
Plastic Instability and Superplasticity
Lecture 06 - Effective Stress and Strain
Lecture 07 - Work Hardening and Flow Behaviour
Lecture 08 - Effect of Strain Rate
Lecture 09 - Combined Effect of Strain, Strain Rate and Temperature
Lecture 10 - Effect of Temperature
Mechanics of Metal Working
Lecture 11 - Cold, Warm and Hot Working
Lecture 12 - Mechanics of Metal Working
Lecture 13 - Wire Drawing
Lecture 14 - Wire Drawing (cont.)
Lecture 15 - Hodographs
Friction and Formability and Case Studies
Lecture 16 - Upper-Bound Analysis
Lecture 17 - Plane Strain Indentation
Lecture 18 - Strain Calculation Models and Friction
Lecture 19 - Types of Friction
Lecture 20 - Effect of Friction in Rolling
Introduction to Vacuum Technology, Physical Vapour Deposition - Evaporation
Lecture 21 - Introduction to Vacuum Technology
Lecture 22 - Vacuum Technology
Lecture 23 - Thermal Evaporation
Lecture 24 - Thermal Evaporation (cont.)
Lecture 25 - Electron-Beam Evaporation, Large Area Evaporation, Pulsed Laser Deposition
Introduction to Plasma, Physical Vapour Deposition - Sputtering
Lecture 26 - Plasma Physics
Lecture 27 - Plasma Physics (cont.)
Lecture 28 - Sputtering
Lecture 29 - Sputtering (cont.)
Lecture 30 - Sputtering (cont.)
Chemical Vapour Deposition - LPCVD, PECVD, MOCVD
Lecture 31 - Chemical Vapor Deposition I
Lecture 32 - Chemical Vapor Deposition II
Lecture 33 - Chemical Vapor Deposition III
Lecture 34 - Chemical Vapor Deposition IV
Lecture 35 - Epitaxy, Molecular Beam Epitaxy and Atomic Layer Deposition
Nucleation and Growth of Thin Films, Special Techniques and Applications
Lecture 36 - Adsorption and Nucleation
Lecture 37 - Thin Film Growth
Lecture 38 - Kinetics of Thin Film Growth
Lecture 39 - Thin Film Morphology - Zone Structure Model
Lecture 40 - Thin Film Characterization
Lecture 41 - Thin Film Characterization (cont.)