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Fabrication of Silicon VLSI Circuits using the MOS Technology

Fabrication of Silicon VLSI Circuits using the MOS Technology. Instructor: Prof. A N Chandorkar, Department of Electrical Engineering, IIT Bombay. This course covers topics in VLSI circuit fabrication and surface micromachining technology - crystal growth; clean rooms; solid state diffusion modeling and technology; ion implantation modeling, technology and damage annealing, characterization of impurity profiles; oxidation: kinetics of silicon dioxide growth for thick, thin and ultrathin films; oxidation technologies in VLSI and ULSI, characterization of oxide films, high k and low k dielectrics for ULSI; lithography: photolithography, E-beam lithography and newer lithography techniques for VLSI/ULSI mask generation; chemical vapour deposition techniques: CVD techniques for deposition of polysilicon, silicon dioxide, silicon nitride and metal films, epitaxial growth of silicon, modeling and technology; metal film deposition: evaporation and sputtering techniques; failure mechanisms in metal interconnects, multilevel metalization schemes; plasma and rapid thermal processing: PECVD, plasma etching and RIE techniques, RTP techniques for annealing, growth and deposition of various films for use in ULSI. (from nptel.ac.in)

Lecture 20 - Ion Implantation


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Lecture 01 - Introduction: Micro to Nano - A Journey into Integrated Circuit Technology
Lecture 02 - Introduction: Micro to Nano - A Journey into Integrated Circuit Technology (cont.)
Lecture 03 - Crystal Properties and Silicon Growth
Lecture 04 - Crystal Properties and Silicon Growth (cont.)
Lecture 05 - IC Fab Labs and Fabrication of IC
Lecture 06 - Diffusion
Lecture 07 - Diffusion (cont.)
Lecture 08 - Solid State Diffusion
Lecture 09 - Solid State Diffusion (cont.)
Lecture 10 - Solid State Diffusion (cont.)
Lecture 11 - Thermal Oxidation of Silicons 1
Lecture 12 - Thermal Oxidation of Silicons 2
Lecture 13 - Thermal Oxidation of Silicons 3
Lecture 14 - Thermal Oxidation of Silicons 4
Lecture 15 - Thermal Oxidation of Silicons 5
Lecture 16 - Lithography
Lecture 17 - Lithography (cont.)
Lecture 18 - Lithography (cont.)
Lecture 19 - Ion Implantation
Lecture 20 - Ion Implantation
Lecture 21 - Ion Implantation and Silicon IC Processing Flow for CMOS Technology
Lecture 22 - Ion Implantation and Silicon IC Processing Flow for CMOS Technology (cont.)
Lecture 23 - Silicon IC Processing Flow for CMOS Technology (cont.)
Lecture 24 - Thin Film Deposition
Lecture 25 - Thin Film Deposition (cont.)
Lecture 26 - Thin Film Deposition (cont.)
Lecture 27 - Thin Film Deposition and Etching in VLSI Processing
Lecture 28 - Etching in VLSI Processing and Backend Technology