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VLSI Technology

VLSI Technology. Instructor: Dr. Nandita Dasgupta, Department of Electrical Engineering, IIT Madras. VLSI (Very Large Scale Integration or Very Large Scale Integrated Circuits) is the process of creating an integrated circuit (IC) by combining hundreds of thousands of transistors or devices into a single chip. This course covers lessons in bipolar junction transistor fabrication, crystal structure, crystal growth, epitaxy, oxidation, diffusion, lithography, etching, metallization, bipolar junction transistor, MOSFET, CMOS and BiCMOS technology. (from nptel.ac.in)

Lecture 40 - BiCMOS technology


Go to the Course Home or watch other lectures:

Lecture 01 - Introduction
Lecture 02 - Bipolar Junction Transistor (BJT) Fabrication
Lecture 03 - MOSFET Fabrication for IC
Lecture 04 - Crystal Structure of Silicon
Lecture 05 - Crystal Structure of Silicon (cont.)
Lecture 06 - Defects in Crystal, Crystal Growth
Lecture 07 - Crystal Growth (cont.), Epitaxy: Vapour Phase Epitaxy
Lecture 08 - Epitaxy: Vapour Phase Epitaxy, Doping during Epitaxy
Lecture 09 - Epitaxy: Doping during Epitaxy (cont.)
Lecture 10 - Epitaxy: Molecular Beam Epitaxy, Oxication
Lecture 11 - Oxidation I – Kinetics of Oxidation
Lecture 12 - Oxidation II - Oxidation Rate Constants
Lecture 13 - Oxidation III – Dopant Redistribution
Lecture 14 - Oxidation IV – Oxide Charges and Oxidation Systems
Lecture 15 - Diffusion I – Theory of Diffusion and Fick's Laws
Lecture 16 - Diffusion II- Infinite Source and Constant Impurity Diffusion
Lecture 17 - Diffusion III - Actual Doping Profile
Lecture 18 - Diffusion IV - Diffusion Systems
Lecture 19 - Ion Implantation Process and Stopping Mechanisms
Lecture 20 - Ion Implantation Systems and Damages during Implantation
Lecture 21 - Annealing of Damages created by Ion Implantations
Lecture 22 - Masking during Implantation, Characterization of Doped Layers
Lecture 23 - Lithography: Optical Lithography
Lecture 24 - Lithography: Electron Beam Lithography, X-ray Lithography
Lecture 25 - Wet Chemical Etching
Lecture 26 - Dry Etching
Lecture 27 - Plasma Etching Systems
Lecture 28 - Etching of Si, SiO2, SiN and Other Materials
Lecture 29 - Plasma Deposition Process
Lecture 30 - Metallization
Lecture 31 - Problems in Aluminium Metal Contacts
Lecture 32 - IC BJT - From Junction Isolation to LOCOS (LOCal Oxidation of Silicon)
Lecture 33 - Problems in LOCOS + Trench Isolation and Selective Epitaxy
Lecture 34 - More about BJT Fabrication and Realization of PNP Transistor
Lecture 35 - I2L Circuits + Transistors in ECL Circuits
Lecture 36 - MOSFET I - Metal Gate vs Self-aligned Poly Gate
Lecture 37 - MOSFET II - Tailoring of Device Parameters
Lecture 38 - CMOS Technology
Lecture 39 - Latch up in CMOS
Lecture 40 - BiCMOS technology